Samsung, TSMC commit to ASML's High NA EUV tools, joining Intel
Chipmakers set 2028 and 2030 adoption dates for ASML's newest lithography machines and agree to move to larger 12-inch photomasks as AI demand grows.
What to know
- Samsung and TSMC now join Intel in committing to ASML's High NA EUV lithography machines, with Samsung targeting 2028 and TSMC 2030.
- All four chipmakers are shifting from legacy 6-inch photomasks to larger 12-inch photomasks to support the new tools.
- The moves are driven by surging AI chip demand, which requires smaller and more complex semiconductor nodes.
- DigiTimes notes TSMC is the only one of the four to specify a firm rollout timeline, leaving Samsung's and Intel's pacing less certain.
“Overcoming the Limits of Semiconductor Miniaturization”
Samsung Electronics and ASML, Joint announcement framing · The Asia Business Daily ↗ · Sep 7
ASML Dutch lithography equipment makerSamsung Electronics Memory and foundry chipmakerTSMC Contract chip foundryIntel Foundry Chipmaker and foundry
How it unfolded 3 developments, newest first · click a bar or a number to jump articlesposts
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DigiTimes notes only TSMC has fixed a rollout date
DigiTimes coverage points out that while ASML has lined up Intel, TSMC and Samsung behind the 12-inch mask transition, TSMC alone has set an explicit timeline, leaving the pace of Samsung's and Intel's rollouts less certain.
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first by DigiTimes, 16d ago
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📢High NA EUV is being adopted for production of leading-edge chips in both logic and memory. Now it's time to look to the future: With TSMC, we're rallying the chip industry around larger masks to give High NA EUV a productivity boost. Learn more 👇
2 more of the top 3 · 4 posts in this stretch
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Get the most important and interesting news from the global economy delivered to your inbox. https:// qz.com/tsmc-samsung-asml-high- na-euv-ai-chips-090826?utm_source=flipboard&utm_medium=activitypub Posted into Business News @ business-news-quartz
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This is big. $INTC & $TSM moving to 6x12" masks. Will mean High-NA EUV can do the same reticle size as Low NA EUV by doubling the mask size. $INTC is ahead, working w. IMS Nano & ASML + lots of interest from large reticle-size GPU designers. The added weight of $TSM helps
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background
Intel Foundry and ASML report a High NA EUV milestone — Intel Foundry and ASML separately report a production milestone for High NA EUV, underscoring Intel's head start in deploying the technology ahead of Samsung and TSMC.
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Samsung and TSMC set 2028/2030 dates for High NA EUV
Samsung and ASML announce an expanded strategic collaboration, with Samsung committing to High NA EUV adoption by 2028 for next-generation DRAM and TSMC by 2030; both join Intel, and all four companies agree to shift from 6-inch to 12-inch photomasks.
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first by eeNews Europe, 16d ago · also KED Global, Korea JoongAng Daily, Bloomberg, Tom's Hardware
4 more headlines
- Samsung, ASML team up on 12-inch photomask ahead of 2028 High NA EUV DRAM rollout KED Global · 16d ago
- Samsung to adopt ASML's High NA EUV for memory chips by 2028 Korea JoongAng Daily · 16d ago
- Samsung and TSMC commit to using ASML's High NA EUV machines by 2028 and 2030, joining Intel, with all four agreeing to shift from 6-inch to 12-inch photomasks Bloomberg · 16d ago
- TSMC, Samsung, and Intel shore up support with ASML to deploy larger High-NA EUV photomasks — 6×12-inch photomask transition may take years despite unified effort Tom's Hardware · 14d ago
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first by Samsung Newsroom, 16d ago · also The Asia Business Daily, Seoul Economic Daily, ASML, Samsung Global Newsroom
2 more headlines
- “Overcoming the Limits of Semiconductor Miniaturization”... Samsung Electronics and ASML to Jointly Develop Next-Generation 12-Inch Photo Masks The Asia Business Daily · 16d ago
- Samsung Teams With ASML on Next-Generation EUV Masks Seoul Economic Daily · 16d ago
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ASML wins EUV tool commitments from TSMC and Samsung
Bloomberg reports ASML has secured commitments from top chipmakers, including TSMC and Samsung, to use its latest production gear as part of a broader push to meet surging AI-driven chip demand.
“ASML Holding NV has won commitments from top chipmakers to use its latest semiconductor production gear, while embarking on a broader agreement to meet surging demand for more powerful artificial intelligence technology.”
— Bloomberg -
first by Quartz, 16d ago · also SamMobile, Focus Taiwan, Yahoo Finance, The Daily Upside
4 more headlines
- Samsung will use ASML's advanced machines to make even better chips SamMobile · 16d ago
- TSMC, ASML partner on 12-inch EUV photomasks for advanced chips Focus Taiwan · 16d ago
- TSMC and Samsung are committing to ASML's most advanced chip-making machines for AI Quartz · 16d ago
- ASML Inks Advanced EUV Lithography Deals With Chip Titans TSMC, Samsung Yahoo Finance · 15d ago
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first by Evertiq, 16d ago · also Intel
1 more headline
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Also covered reported alongside — the timeline has no entry for these yet
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first by Phoenix Business Journal, 16d ago · also Forbes, HotHardware, SammyGuru
3 more headlines
- TSMC To Use ASML Photolithography Gear For Next-Gen Chips Forbes · 16d ago
- ASML, TSMC, And Samsung Team Up To Solve Next-Gen Chip Bottleneck HotHardware · 16d ago
- Samsung Pushes ASML's High NA EUV for Next-Gen Chipmaking SammyGuru · 16d ago
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first by The Korea Times, 16d ago · also eeNews Europe
1 more headline
- Samsung and ASML expand High NA EUV push for next-gen DRAM eeNews Europe · 16d ago
and 6 smaller pieces
What people are saying 1 voices from 1 site · best of 4 · verbatim
- Sep 8
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Just in: TSMC has finally chosen to adopt High-NA EUV. And to develop larger photomasks to go with it. This is HUGE news for @ASMLcompany